The AI Art Magazine Number 4 Open Call: Submit AI Art by 1 November 2026
The AI Art Magazine has opened submissions for Number 4, inviting artists who work with and through artificial intelligence to contribute to its next print edition. The international call runs from 28 September to 1 November 2026, and there is no submission fee.
This open call is for artists across disciplines and backgrounds. Collaborative works are welcome, and the organizers have not set a prescribed theme. Rather than responding to a narrow brief, applicants can select a piece that meaningfully represents their artistic practice with AI.
Each artist may submit one work. Applicants are also asked to provide a short explanation of their practice and how the artwork was made. Submissions are handled through the magazine’s online Artist Space, which is linked from the organizer’s official Number 4 page.
The editorial selection is for a physical printed art magazine, not merely an online gallery. An international jury plans to select approximately 50 works for the fourth edition; publication is planned for 2027, while the detailed release timetable may change.
For artists working in generative imagery, moving image, AI-mediated design and other experimental creative formats, this is an opportunity to articulate the relationship between technical process, conceptual intention and the resulting artwork. Check the organizer’s current submission categories and file requirements in Artist Space rather than assuming that every format is supported.
Key details: Open call 28 September–1 November 2026; submission fee: none; selection: around 50 works; theme: unrestricted; entries: one work per artist; publication: planned for 2027. The organizer does not specify a time zone for the closing date on the public call page, so submit well before 1 November ends.
Official application details and Artist Space entry point: https://www.art-magazine.ai/edition/number-four . Questions can be sent to we@art-magazine.ai. Always review the original call and submission conditions before applying.

